A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2020; you can also visit the original URL.
The file type is application/pdf
.
Electromagnetic and Semiconductor Modeling of Scanning Microwave Microscopy Setups
2020
IEEE Journal on Multiscale and Multiphysics Computational Techniques
This paper presents finite difference time domain (FDTD) and finite element method (FEM) based electromagnetic modeling and simulation of an industrial scanning microwave microscopy (SMM) material measurement setup. These two methods have been employed to cross verify each other for classical electromagnetic simulations of the homogeneous conductive materials under SMM. For the SMM simulations involving semiconductor materials; however, a coupled multiphysics solver is required in addition to
doi:10.1109/jmmct.2020.3027908
fatcat:kpfcgoeqz5empji7k2bmbmvmtm