A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2020; you can also visit the original URL.
The file type is application/pdf
.
Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development
2019
Japanese Journal of Applied Physics
Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface subjected to ion bombardment. To control such processing, methods for process monitoring, equipment control, modeling and simulation, and controlling plasma-induced damage, are required. Here, we
doi:10.7567/1347-4065/ab163b
fatcat:ug7te4csnrdtjcqjekmmbjyi64