Development of nanostructured titanium oxide thin films using a gas carving technique

Deepak Dhawan, Ylias Sabri, Suresh Bhargava, Dinesh Sood, K. Kalantar-Zadeh, Jung-Chih Chiao, Andrew S. Dzurak, Chennupati Jagadish, David V. Thiel
2006 Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III  
A method is developed for producing nano-structured titanium oxide thin films using H 2 gas interaction with titanium thin film at a high temperature. These nano-structured thin films have been formed on a quartz crystal substrate. Titanium (Ti) thin films were deposited on the quartz crystal using a RF magnetron sputterer. The samples were placed in the oven at 500-800°C for 5 hours. The gas mixture of 1% H 2 in N 2 was introduced in the oven. The process of Ti annealing in the presence of H 2
more » ... carves Ti films into nano-structure shapes. The process is a gas-solid interaction. Thin films were characterised using Scanning Electron Microscopes (SEM) and X-Ray Diffraction (XRD) technique. The nano structures formed have dimensions in a range of 25nm -150nm obtained after gas carving.
doi:10.1117/12.695539 fatcat:4ykfzjyj5bhotawdgzzqxyzr5y