Structure Change under 1 MeV Electron Beam Irradiation of Amorphous-contained Nano-sized W-dendrites Fabricated on Alumina Substrates with Electron-beam-induced Deposition

M Song, G Xie, K Mitsuishi, M Takeguchi, K Furuya
2005 Microscopy and Microanalysis  
Electron-beam-induced deposition (EBID) is a promising technique to fabricate small-sized structures on substrates and is expected to be applied in technology [1]. Compact structures are usually fabricated with this technique. Recently, nanometer-sized W-dendritic and other branched structures were fabricated on insulator substrates with EBID in a 200 kV transmission electron microscope (TEM) [2]. However, one problem is that the nanodendrite usually contains amorphous. It is desirable to
more » ... ate crystalline nanodendrite structures for their potential applications. In the present work, W-nanodendrite structure is fabricated on Al 2 O 3 substrate in a 200 kV TEM, then irradiated with 1 MeV electron beam (EB) in a high voltage transmission electron microscope (HVTEM). Further more, nanodendrites are fabricated with EBID using higher energy EB. Structure and morphology of the nanodendrite are characterized.
doi:10.1017/s1431927605503179 fatcat:uqfgw7cyobc3tkxubergl4oyoe