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Proc. Int. Conf. and Summer School on Advanced Silicide Technology 2014
The radio frequency plasma enhanced chemical vapor deposition (PECVD) of the hydrogenated amorphous silicon (a-Si:H) combined with the vacuum evaporation of magnesium followed by the hydrogen plasma treatment has been successfully applied for the in-situ deposition of magnesium silicide nanoparticles embedded in hydrogenated amorphous silicon thin layers. The homogeneous coverage of a-Si:H surface by magnesium silicide nanoparticles with diameter below 10 nm has been confirmed by the scanningdoi:10.7567/jjapcp.3.011301 fatcat:qez6a4wkufbzln5djenmubn2da