Deposition of magnesium silicide nanoparticles by the combination of vacuum evaporation and hydrogen plasma treatment

Jiri Stuchlik, The Ha Stuchlikova, Anna Artemenko, Zdenek Remes
2015 Proc. Int. Conf. and Summer School on Advanced Silicide Technology 2014   unpublished
The radio frequency plasma enhanced chemical vapor deposition (PECVD) of the hydrogenated amorphous silicon (a-Si:H) combined with the vacuum evaporation of magnesium followed by the hydrogen plasma treatment has been successfully applied for the in-situ deposition of magnesium silicide nanoparticles embedded in hydrogenated amorphous silicon thin layers. The homogeneous coverage of a-Si:H surface by magnesium silicide nanoparticles with diameter below 10 nm has been confirmed by the scanning
more » ... d by the scanning electron microscopy (SEM) and X−ray photoelectron spectroscopy (XPS).
doi:10.7567/jjapcp.3.011301 fatcat:qez6a4wkufbzln5djenmubn2da