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We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of optical thin films. Our method is based on digital holography and uses a self-referenced scheme to cancel the effects of the severe constraints generated by the vibrational and thermal environment of the deposition machine.doi:10.1364/oe.394953 pmid:32752470 fatcat:2lg4b5mkdbg4necfjkyzkhumyq