Fabrication of ferroelectric Fe doped HfO2 epitaxial thin films by ion-beam sputtering method and their characterization

Takahisa Shiraishi, Sujin Choi, Takanori Kiguchi, Takao Shimizu, Hiroshi Uchida, Hiroshi Funakubo, Toyohiko J. Konno
2018 Japanese Journal of Applied Physics  
doi:10.7567/jjap.57.11uf02 fatcat:xtanes6twfephnvw3g3eb4fvt4