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Epitaxial Barium Titanate (BaTiO3) thin films were fabricated on Platinised (Pt 111) Si/SiO2 wafer by spin coating of metalloorganic sol gel solution. A preferred directional growth was obtained for BT (BaTiO3) thin film by employing Platinum (111) coating as a template. BT film was heat-treated at 700°C for 1 hour using the direct insertion method. The film was epitaxially grown with (111) and (211) being parallel to the Pt(111). The epitaxial growth of the thin film along (111) orientationdoi:10.5185/amlett.2012.11476 fatcat:lai7guxd3fhrzd462lhsbuieiq