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First time AlMgB 14 films were prepared in Ames Lab by pulsed laser deposition technique. In this work, RF magnetron sputtering from a single stoichiometric target was employed to fabricate hard AlMgB 14 coatings on Si wafer and industrial items. Measurements of nanohardness and elastic Young's modulus were performed to determine reliable strength characteristics of samples. Smooth 3 μm thick AlMgB 14 films with the RMS surface roughness to be less than 1 nm exhibit hardness of 34 GPa anddoi:10.1088/1742-6596/769/1/012039 fatcat:7bssvpga4bb2rnctrackni4bsi