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The article presents the results of the development of technology for the formation of vacuum field emission structures. Experimental studies of local ion-stimulated deposition of W and C and ion-beam etching were carried out and their effects on the formation of final structures were studied. The technological process of manufacturing nanoscale field emission structures was developed, and experimental samples were fabricated. It is shown that the use of the method of focused ion beams (FIB)doi:10.1088/1742-6596/1410/1/012236 fatcat:hdvo75dzlrazdor4br2ju6ijvm