Highly Reliable B4-Flash Technology for High Density Embedded NVM Application

N. Ajika, S. Shukuri, S. Shimizu, T. Ogura, M. Mihara, K. Kobayashi, M. Nakashima
2011 2011 3rd IEEE International Memory Workshop (IMW)  
This paper reports 90nm embedded B4-Flash technology and its superior performance and reliability. Embedded B4-Flash has been implemented to certain 90nm CMOS process and fabricated its 16Mbit test array chip. B4-Flash superiority of high speed program and erase, high reliability has been confirmed by evaluating the 16Mbit test array chip and single bit test vehicle. Direct comparison of the retention reliability between B4-Flash and conventional NOR fabricated in the same silicon has been
more » ... licon has been carried out, for the first time. Superiority of B4-Flash reliability to conventional NOR, which has been pointed out in the previous paper [4] has been confirmed, accordingly.
doi:10.1109/imw.2011.5873185 fatcat:lzxx4yh6o5b7bciufaq73hw3ta