Selective growth of TiO[sub 2] thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

B.-C. Kang, J.-H. Lee, H.-Y. Chae, D.-Y. Jung, S.-B. Lee, J.-H. Boo
2003 Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena  
We successfully patterned TiO 2 thin films by metalorganic chemical vapor deposition ͑MOCVD͒ on Si͑100͒ substrates where the surface was first modified by an organic thin film. The organic thin film ͓octadecyltrichlorosilane ͑OTS͔͒ of self-assembled monolayers ͑SAMs͒ was deposited by microcontact printing. Selective deposition of a 130 nm thick TiO 2 film was done on a 300-500°C surface prepared by MOCVD without any carrier or bubbler gas. Auger electron spectroscopy and x-ray diffraction
more » ... es showed that the deposited TiO 2 material was stoichiometric, polycrystalline, and consisted of anatase phase. Alpha-step profile and optical-microscopic images also showed that the boundaries between the OTS SAMs and selectively deposited TiO 2 thin film areas are definite and sharp. Capacitance-voltage measurement of a TiO 2 thin film yielded a dielectric constant of 29, suggesting possible application to electronic materials.
doi:10.1116/1.1585071 fatcat:htfkmrmobvaohpeg5tf5kj2uwi