Plasma-Assisted Atomic Layer Deposition of Nickel Oxide as Hole Transport Layer for Hybrid Perovskite Solar Cells

Dibyashree Koushik, Marko Jošt, Algirdas Dučinskas, Claire Burgess, Valerio Zardetto, Christ Weijtens, Marcel A. Verheijen, Wilhelmus Kessels, Steve Albrecht, Mariadriana Creatore
2019 Journal of Materials Chemistry C  
Low-temperature atomic layer deposition (ALD) offers significant merits in terms of processing uniform, conformal and pinhole-free thin films, with sub-nanometer thickness control. In this work, plasma-assisted atomic layer deposition (ALD)...
doi:10.1039/c9tc04282b fatcat:xgem4fksuje3lji4gdtungtkx4