Metallic Osmium Coating on Microstructures by Plasma CVD

Yuko KAWASHIMA
2020 Vacuum and Surface Science  
Osmium coating on microstructures becomes possible by the plasma CVD technique. A metallic osmium film has excellent heat-resistance, conductivity, hardness and environmental performance. An osmium film coated on an electron-microscope aperture-plate is very effective in electrified restraint and beam damage reduction.
doi:10.1380/vss.63.69 fatcat:ff3m76q2vbh6bbtgtjq3vl3cjy