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We introduce a model for stochastic transport on a one-dimensional substrate with particles assuming different conformations during their stepping cycles. These conformations correspond to different footprints on the substrate: in order to advance, particles are subject to successive contraction and expansion steps with different characteristic rates. We thus extend the paradigmatic exclusion process, provide predictions for all regimes of these rates that are in excellent agreement withdoi:10.21468/scipostphys.6.6.077 fatcat:xoetbpsxkzb4xmqr6qu6x2g3pi