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Preparation of Si Oxide Films for MIS Type Tunnel Emitter by Hollow Cathode Enhanced DC Plasma Oxidation
ホロー陰極直流放電プラズマ酸化による金属‐絶縁物‐半導体型トンネルエミッタ用Si酸化膜の形成
1998
Shinku
ホロー陰極直流放電プラズマ酸化による金属‐絶縁物‐半導体型トンネルエミッタ用Si酸化膜の形成
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