X-ray reflectivity characterization of atomic layer deposition Al2O3/TiO2 nanolaminates with ultrathin bilayers

Sakari Sintonen, Saima Ali, Oili M. E. Ylivaara, Riikka L. Puurunen, Harri Lipsanen
2014 Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films  
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more » ... precise control over layer thicknesses. In this work, ultrathin Al 2 O 3 /TiO 2 nanolaminate structures deposited by atomic layer deposition from Me 3 Al, TiCl 4 , and H 2 O precursors with intended bilayer thicknesses ranging from 0.1 to 50 nm were characterized by x-ray reflectivity (XRR) measurements. The measurements were simulated to obtain values for thickness, density, and roughness of constituting layers. XRR analysis shows that the individual layers within the nanolaminate remain discrete for bilayers as thin as 0.8 nm. Further reduction in bilayer thickness produces a composite of the two materials.
doi:10.1116/1.4833556 fatcat:kom24ciklfanthqpay6lmm452y