Dual radio frequency plasma source: Understanding via electrical asymmetry effect

B. Bora, H. Bhuyan, M. Favre, E. Wyndham, C. S. Wong
2013 Journal of Applied Physics  
On the basis of the global model, the influences of driving voltage and frequency on electron heating in geometrically symmetrical dual capacitively coupled radio frequency plasma have been investigated. Consistent with the experimental and simulation results, non-monotonic behavior of dc self bias and plasma heating with increasing high frequency is observed. In addition to the local maxima of plasma parameters for the integer values of the ratio between the frequencies (n), ourstudies also
more » ... ourstudies also predict local maxima for odd integer values of 2n as a consequence of the electrical asymmetry effect produced by dual frequency voltage sources. V C 2013 AIP Publishing LLC [http://dx.
doi:10.1063/1.4801874 fatcat:isorfbppbncxpllirghyiv7sxe