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High resolution magnetic force microscopy of patterned L10-FePt dot arrays by nanosphere lithography
2008
Nanotechnology
High resolution magnetic force microscopy (MFM) has been carried out on L1 0 -FePt dot arrays patterned by plasma modified nanosphere lithography. An ex situ tip magnetization reversal experiment is carried out to determine the magnetic domains and verify the imaging stability of MFM and the mutual perturbations between the magnetic tip and the sample. We have identified that the critical size for the single domain region is about 90 nm across. Comparison with MFM image simulation also suggests
doi:10.1088/0957-4484/19/9/095703
pmid:21817685
fatcat:y6xreysfgjcedisgnfqtux4hxu