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Deep UV lithography for planar photonic crystal structures
The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003.
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We demonstrate deep UV lithography at 248nm to be a useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.
doi:10.1109/leos.2003.1253020
fatcat:olfttse66zfadio7sslr5utqsq