Deep UV lithography for planar photonic crystal structures

W. Bogaerts, P. Dumon, J. Van Campenhout, V. Wiaux, J. Wouters, S. Beckx, D. Taillaert, B. Luyssaert, D. Van Thourhout, R. Baets
The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003.  
We demonstrate deep UV lithography at 248nm to be a useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.
doi:10.1109/leos.2003.1253020 fatcat:olfttse66zfadio7sslr5utqsq