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Laser-Assisted Resist Removal
The Review of Laser Engineering
We have developed a new laser application called laser-assisted resist removal. Laser irradiation far below the ablation threshold can be used to remove a photoresist strongly adhered to a base material (metal or plastic). We employed the second harmonics of Q-switched Nd:YAG laser pulses to irradiate the sample. At an appropriate laser fluence, the photoresist, which transmits the laser light, was detached from the substrate while maintaining its original shape. The technique is not based ondoi:10.2184/lsj.33.452 fatcat:3zhiwetdvnf6fedmdtq7uqibxm