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Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay

Alexander Starikov
2019 Journal of Micro/Nanolithography  

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https://web.archive.org/web/20200307174046/https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-18/issue-2/021201/Special-Section-Guest-Editorial--Control-of-Integrated-Circuit-Patterning/10.1117/1.JMM.18.2.021201.pdf

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doi:10.1117/1.jmm.18.2.021201 fatcat:cw74wfw3sre73dxa5c7gg4moqq
Citation

Alexander Starikov. "Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay." Journal of Micro/Nanolithography 18.02 (2019)