Elastic strain and dopant activation in ion implanted strained Si nanowires

R. A. Minamisawa, S. Habicht, D. Buca, R. Carius, S. Trellenkamp, K. K. Bourdelle, S. Mantl
2010 Journal of Applied Physics  
doi:10.1063/1.3520665 fatcat:zhihc3ocpvh7hlq2hxmyqlqzka