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This paper investigates the feasibility of using SU-8 as a high contrast x-ray resist. The SU-8 resist was irradiated with various x-ray doses and then developed for a fixed time. The developing rate was then measured and plotted versus absorbed x-ray dosage. The results revealed that SU-8 exhibited very high lithographic contrast other than elevated sensitivity. Therefore, a very thin mask absorber is required to switch the negative resist 'ON' or 'OFF'. Preliminary results showed that 1 µmdoi:10.1088/0960-1317/13/5/324 fatcat:ylg5d76sovd7bgb4abbubijsaq