Mass spectrometric analysis of acid-assisted photochemical release of the trimethyl lock system on the monolayers on gold

Geunhyeok Yu, Woon-Seok Yeo
2020 RSC Advances  
The acid-assisted photolysis of the trimethyl lock on the surface was characterized by mass spectrometry.
doi:10.1039/d0ra02110e fatcat:7w65f7rmjfhfpeycp3w7ix5yfq