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2003 European Control Conference (ECC)
The problem of designing a robust controller to solve a tracking control problem for improving plasma characteristics in Reactive Ion Etching Systam is studied. The presented design methodology is based on the construction of a two-time scale motions of the closed-loop system. It has been shown that a sufficiently small perturbation parameter associated with the dynamical controller consisting of high order derivatives of the output signal, induces a two time-scale separation of the fast anddoi:10.23919/ecc.2003.7085122 fatcat:bi27by25qvcyhngwhawn6rwpfy