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イオン化蒸着法による有機EL用電荷輸送材料の重合膜形成
Preparation of Hole Transport Layer for Organic EL Devices by Ionization-assisted Deposition
2001
ITE Technical Report
Preparation of Hole Transport Layer for Organic EL Devices by Ionization-assisted Deposition
The ionization − assisted method was used to prepare villyl polymer films of tetraphenyl − diam血obiphenyl ( TPD ) . The electron irradiation in t瓱 e deposit 重 on prooess was effective to en ハ anco the polym ¢ r孟 zation reaction . Thc reaction appears to be driven by neutral radicals produccd by the eiectron irradiation . The polymerization was also enhanced by increas 孟 皿 g the substrate temperatUre during the deposi 口on , and by pos 卜 a ealing in vacuum . At an appropriate condition , the
doi:10.11485/itetr.25.23.0_7
fatcat:rseghnfbdngmzick7rpgkpvxuy