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Photoconductivity of Aliphatic Polyimides(2); Photoconduction Mechanism and Their Sensitization
1997
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
JAPAN Photoconduction mechanism of an aliphatic polyimide, PI(PMDA/DCHM), and its sensitization by the addition of N,N,N'N'-tetramethyl-p-phenylenediamine(TMPD) were investigated by comparing them with those for an aliphatic polyimide containing two methyl substituents, PI(PMDA/DMDHM), and an aromatic polyimide, PI(PMDA/ODA). Photoconductivity of PI(PMDA/DCHM) would be the result of the weak intermolecular interaction formed by mixed layer packing arrangement between pyromellitic moiety of one
doi:10.2494/photopolymer.10.241
fatcat:r2ne27awcveebefa6qyr2rubaq