Effect of rapid thermal annealing on crystallization and stress relaxation of SiGe nanoparticles deposited by ICP PECVD

Florent Ravaux, Nitul S. Rajput, Jehad Abed, Leslie George, Mike Tiner, Mustapha Jouiad
2017 RSC Advances  
This work demonstrates the viability of direct fabrication utilizing a single (deposition/anneal) process for polycrystalline silicon germanium sub-micro particles.
doi:10.1039/c7ra04426g fatcat:dxfb3maf35a2fp4sqoxhwnexey