The new generation of accelerators places higher demands on the surfaces of vacuum chamber materials. Search for low secondary electron yield (SEY) materials and an effective vacuum chamber surface treatment process, which can effectively reduce the electronic cloud effect, are important early works for the new generation of accelerators. In this work, we revealed the SEY characteristics of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films which were deposited on Si (111) substrates using direct

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... t magnetron sputtering method. The surface morphology and surface chemical bonding information were collected by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). With the same parameters, the maximum SEY of Ti-Zr-Hf-V NEG films and Ti-Zr-V NEG films are 1.24 and 1.51, respectively. These results are of great significance for the next-generation particle accelerators.