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Spot defects in memory devices are caused by imperfections in the fabrication process of these devices. In order to analyze the faulty effect of spot defects on the memory behavior, simulations have been performed on an electrical model of the memory in which the defects are injected, causing opens, shorts, or bridges. In this paper, simulation is used to analyze the faulty behavior of embedded DRAM (eDRAM) devices produced by Infineon Technologies. The paper applies the new approach of faultdoi:10.1109/tc.2003.1183945 fatcat:w257b2haufa2rnhrcwckmrt3sq