A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2007; you can also visit the original URL.
The file type is
 Proceedings IEEE Micro Electro Mechanical Systems
AbStlWl A single-crystal slhcon, high aspect ratlo, low-temperature process sequence for the fabrlcatlon of suspended rmcroelectromechamcal structures (MEMS) usmg a smgle hthography step and reactwe Ion etching (RIE) IS presented The process IS called SCRJZAM I (single-crystal reactwe etchmg and metalhzatmn) SCREAM I IS a bulk mlcromachmmg process that uses RIE of a s~hcon substrate to fabricate suspended movable smgle-crystal s&on (SCS) beam structures Beam elements wth aspect ratios of 10 todoi:10.1109/memsys.1993.296930 fatcat:num236tmcfforizvh46ck5nywu