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The growth front roughness of Ta 2 O 5 amorphous films grown by pulsed plasma d.c. reactive sputtering has been investigated using atomic force microscopy. Film deposition during reactive sputter deposition is explained based on dynamic scaling hypothesis in which both time and space scaling are considered simultaneously. The interface width w increases as a power law with deposition time t, w~t β , with β = 0.45 + 0.03. The lateral correlation length ξ grows as ξt 1/z , with 1/z = 0.61 + 0.07.doi:10.1557/proc-749-w5.11 fatcat:lxxbdmw5cnhuxonsnmzvjr6ixm