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͑Ti,Al͒N films were deposited by an off-plane double bend filtered cathodic vacuum arc technique in N 2 ambient at room temperature. X-ray diffraction ͑XRD͒ and Raman spectroscopy were used to characterize the film structure. The influence of deposition pressure and the substrate bias on the XRD patterns and Raman spectra were systematically studied. As deposition pressure is increased, the film structure evolves from metallic, to metal rich (Ti,Al͒ 2 N, and finally to a single face-centereddoi:10.1063/1.1352564 fatcat:tjmfjdhxtbahvj2ch7zmz3wicu