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Dependence of the Noise Behavior on the Drain Current for Thin Film Transistors
IEEE Electron Device Letters
In this letter, a noise formula is newly proposed to calculate the low frequency noise for the three kinds of amorphous silicon, low temperature polycrystalline silicon, and amorphous indium-gallium-zinc oxide (a-IGZO) thin film transistors (TFTs). It is found that the noise behavior of the TFT depends on its drain current in a simple manner. Based on the analysis, the ratios of drain current to the noise level for these TFTs are compared. It reveals that a-IGZO TFT is the best candidate to bedoi:10.1109/led.2013.2291565 fatcat:kowm542i7vhr3hwofpkcv3weky