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Ultra Fine Pattern Formation Technologies Using Masks
VLSI超微細画像形成技術の展望 マスクによる超微細画像形成技術
1991
Journal of Printing Science and Technology
VLSI超微細画像形成技術の展望 マスクによる超微細画像形成技術
Preserved Fulltext
As a pattern formation technology, the exposure method using photo masks is superior in productivity to any other methods, so it has been utilized in many kinds of industrial fields for a long time. This paper de
doi:10.11413/nig1987.28.329
fatcat:eek5syrq65hgxg6umjrbjrcncm