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methan and hydrogen was used. Secondly, the cleaning step is the result of several contamination investigations. For a clear insight into the efficiency of our cleaning procedure, atomic force microscope (AFM) measurements were performed just after epitaxy (Fig. 2) . A comparison with AFM measurements obtained on the same wafer when processed as described above is reported in Fig. 3 . Note that the surface morphology before and after technology is the same on a nanometer depth scale and revealsdoi:10.1049/el:19980361 fatcat:k2jgh6saurbghe5hkyqkouk7o4