A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2019; you can also visit the original URL.
The file type is
This paper describes the lithographic properties of eleven acid amplifiers (AAs) and the chemical modeling approach used to predict their thermal stability in an ESCAP polymer resist system at 70 and 110 °C. Specifically, we show how added AAs affect the sensitivity (Eo and Esize), resolution, line edge roughness (LER), exposure latitude, and Z-parameter of ESCAP resists. We found that acid amplifiers that generate fluorinated sulfonic acids give the best combination of sensitivity, LER, anddoi:10.2494/photopolymer.22.43 fatcat:hk7u5qcqabaqhet7m3xb63ywve