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3D Micro/Nanopatterning of a Vinylferrocene Copolymer
2020
In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and reverse NIL patterning of polyvinylferrocene and vinylferrocene-methyl methacrylate copolymers to prepare complex non-spherical objects and patterns. While neat polyvinylferrocene was found to be
doi:10.17170/kobra-202005291311
fatcat:vzyn3n5b45gx7gik3sschyyqbu