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Surface roughness induced electron mobility degradation in InAs nanowires
2013
Nanotechnology
In this work, we present a study of the surface roughness dependent electron mobility in InAs nanowires grown by the nickel-catalyzed chemical vapor deposition method. These nanowires have good crystallinity, well-controlled surface morphology without any surface coating or tapering and an excellent peak field-effect mobility up to 15 000 cm 2 V −1 s −1 when configured into back-gated field-effect nanowire transistors. Detailed electrical characterizations reveal that the electron mobility
doi:10.1088/0957-4484/24/37/375202
pmid:23965340
fatcat:nap66jqiubcipmp5bvflmbouzq