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Isotopic Labeling Studies of EUV Photoresists Containing Antimony
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
We have investigated the mechanism of photodecomposition of antimony carboxylate complexes of the type Ph 3 Sb(O 2 CR′) 2 by means of EUV outgassing in combination with isotopic labeling. When exposed to EUV light, these compounds decompose to form CO 2 , benzene and phenol. The source of hydrogen needed to create phenol can be traced to hydrogens originating in the original organometallic complex. However, it is much more difficult to trace the origin of the hydrogen needed to convert thedoi:10.2494/photopolymer.31.233 fatcat:q62vatmlaffpvm7dzca2khgm2e