GaN-Based High-$Q$ Vertical-Cavity Light-Emitting Diodes

Tien-Chang Lu, Tsung-Ting Kao, Chih-Chiang Kao, Jung-Tang Chu, Kang-Fan Yeh, Li-Fan Lin, Yu-Chun Peng, Hung-Wen Huang, Hao-Chung Kuo, Shing-Chung Wang
2007 IEEE Electron Device Letters  
We report a fabrication and demonstration of a GaN-based high-Q vertical-cavity light-emitting diode (VCLED). The GaN VCLED is composed of a 25-pair high-reflectivity (98%) GaN/AlN distributed Bragg reflector (DBR), an eight-pair SiO 2 /Ta 2 O 5 dielectric DBR (99%), and a three-λ optical thickness InGaN/GaN active region. It shows a very narrow linewidth of 0.52 nm, corresponding to a cavity Q-value of 895 at a driving current of 10 mA and a dominant emission peak wavelength at 465.3 nm. In
more » ... ition, this VCLED emission linewidth continues to decrease with an increasing injection current, suggesting a possible realization of GaN-based vertical-cavity surface emitting lasers. Index Terms-GaN, light-emitting diode (LED), vertical cavity, vertical-cavity LED (VCLED).
doi:10.1109/led.2007.904906 fatcat:ilsvybyupnadxildacbzjiyupi