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We present a rate equation model for submonolayer island growth under conditions where hyperthermal deposition techniques such as low-energy ion deposition are employed to achieve smooth layerby-layer growth. By asymptotic analysis, we demonstrate that the model exhibits stationary behavior with well-defined dynamic and growth exponents and , respectively, in the limit of small and high detachment rates. We verify these predictions by using the particle coalescence simulation method. Thedoi:10.1103/physrevlett.92.086103 pmid:14995796 fatcat:eklayiygqnffdln6bibo2rxaai