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A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System
2000
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
Preserved Fulltext
Keywords: bilevel structure, wet development, shallow recessed pattern, plasma blanking, positive-tone image of high aspect ratio
doi:10.2494/photopolymer.13.535
fatcat:qnskjxznrbbmjbzm2r22c65qum