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A novel distributed system for plasma immersion ion implanter control and automation
1998
Review of Scientific Instruments
The high voltage and electromagnetic field environment poses a big challenge to a control system for plasma immersion ion implantation ͑PIII͒. The automation process must be immune to electric field interference produced by the high voltage power supply, modulator, radio-frequency or microwave plasma generator, MEVVA plasma sources, and so on. We have recently designed and installed a distributed control system, PIIIDCS, to automate the operation of our PIII facility. Programmable logic
doi:10.1063/1.1148785
fatcat:zrgqzbgdx5gapcy7jjbjv5lkhm