Stress-induced morphology and fine-line stability enhancement of NiSi on poly-SiGe with a buffer polycrystalline silicon interlayer

Chi-Chang Wu, Wen-Fa Wu, Fu-Hsiang Ko, Hsin-Chiang You, Wen-Luh Yang
2008 Applied Physics Letters  
Formation of nickel silicide and germanosilicide layers on Si(001), relaxed Si Ge Si ( 001 ) , and strained Si/relaxed Si Ge Si ( 001 ) and effect of postthermal annealing
doi:10.1063/1.2920202 fatcat:jn7x2z2hrfhrfgar5wi5gbd3pi