Optical measurement of Cs distribution in the large negative ion source

K. Ikeda, K. Nagaoka, Y. Takeiri, U. Fantz, O. Kaneko, M. Osakabe, Y. Oka, K. Tsumori
2008 Review of Scientific Instruments  
To investigate a Cs behavior, optical diagnostic tools have been installed in the large negative ion source, an arc discharge used at large helical device neutral beam injector. A large Cs sputtering is observed during beam extraction due to the backstreaming H + ions. Distribution of Cs + light is uniform in the case of a balanced arc discharge, but large increase of Cs + light during beam extraction is observed in a nonuniform arc discharge. Controlling of the discharge uniformity is
more » ... to reduce the local heat loading from the backstreaming H + ions at the backplate of ion source.
doi:10.1063/1.2816958 pmid:18315139 fatcat:ijibnj5otjd67aocwe77zrrmhu