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Optical measurement of Cs distribution in the large negative ion source
Review of Scientific Instruments
To investigate a Cs behavior, optical diagnostic tools have been installed in the large negative ion source, an arc discharge used at large helical device neutral beam injector. A large Cs sputtering is observed during beam extraction due to the backstreaming H + ions. Distribution of Cs + light is uniform in the case of a balanced arc discharge, but large increase of Cs + light during beam extraction is observed in a nonuniform arc discharge. Controlling of the discharge uniformity isdoi:10.1063/1.2816958 pmid:18315139 fatcat:ijibnj5otjd67aocwe77zrrmhu