A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2008; you can also visit the original URL.
The file type is application/pdf
.
Magnetic depth profiling Co/Cu multilayers to investigate magnetoresistance (invited)
2000
Journal of Applied Physics
The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6nm)/Cu(6nm)] 20 multilayers was analyzed using polarized neutron reflectivity (PNR) and scanning electron microscopy with polarization analysis (SEMPA). This paper focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the
doi:10.1063/1.372796
fatcat:rj7vij34yjfmdl32pajsvzekn4