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Emerging Lithographic Technologies IX
The escalating costs of lithography for the sub 90nm regime have been well documented. The semiconductor industry is exploring evolutionary improvements to existing photolithographic techniques as well as disruptive, but cost effective patterning technologies for the demanding highresolution requirements. Step and Flash Imprint Lithography (S-FIL™) is an innovative patterning technology commercialized by Molecular Imprints. S-FIL has demonstrated the capability to pattern very high-resolutiondoi:10.1117/12.599921 fatcat:ijghr4yqdjam5emw3unozdzpgq