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Preparation of Thin-Films by Wet Method-Their Structure and Properties. SiO2 Film Deposited by Liquid Phase Deposition Method for Electronic Devices
湿式法による化合物薄膜の作製・構造と物性 液相析出法(LPD法:Liquid Phase Deposition)による電子材料の作製
1998
Journal of The Surface Finishing Society of Japan
湿式法による化合物薄膜の作製・構造と物性 液相析出法(LPD法:Liquid Phase Deposition)による電子材料の作製
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